Therefore, such factors having effect on theprecisionofdeepUVlithographyasdiffractioneffect, exposure dosage, wavelength and distribution of fly's eyes lens etc.
If this (topdown) manufacturing process is to be based on the most modern forms of deposition (including epitaxy), e-beam or ultra-deep UV lithography and precision etching, the mainstay of microelectronics and optoelectronics fabrication, then there are strict limits described below for which one-off fabrication is possible, but manufacture is not.